Thewater vapor oxidation is take the high pure water steam as theoxidizing atmosphere, responds the production silicon dioxide by thesilicon chip surface silicon atom and the hydrone.
水汽氧
是以高纯水蒸汽为氧气氛，由
片表面的
水分反
生成二氧。
Thewater vapor oxidation is take the high pure water steam as theoxidizing atmosphere, responds the production silicon dioxide by thesilicon chip surface silicon atom and the hydrone.
水汽氧是以高纯水蒸汽为氧气氛，由片表面的水分反生成二氧。
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