The hydrated silicon dioxide with three layers structure of micron-submicron-millimicron was observed through TEM.
通过电镜实验,观察到水合二氧化硅具有微米亚微米纳米三次结。
The hydrated silicon dioxide with three layers structure of micron-submicron-millimicron was observed through TEM.
通过电镜实验,观察到水合二氧化硅具有微米亚微米纳米三次结。
Thewater vapor oxidation is take the high pure water steam as theoxidizing atmosphere, responds the production silicon dioxide by thesilicon chip surface silicon atom and the hydrone.
水汽氧化是以高纯水蒸汽为氧化气氛,由硅片表面的硅原子和水分子成二氧化硅。
声明:以上句、词性分类均由互联网资源自动
成,部分未经过人工审核,其表达内容亦不代表本软件的观点;若发现问题,欢迎向我们指正。
The hydrated silicon dioxide with three layers structure of micron-submicron-millimicron was observed through TEM.
通过电镜实验,观察到水合二氧化硅有
米亚
米纳米三次结
。
Thewater vapor oxidation is take the high pure water steam as theoxidizing atmosphere, responds the production silicon dioxide by thesilicon chip surface silicon atom and the hydrone.
水氧化是以高纯水
氧化气氛,由硅片表面的硅原子和水分子反应生成二氧化硅。
声明:以上例句、词性分类均由互联网资源自动生成,部分未经过人工审核,其表达内容亦不代表本软件的观点;若发现问题,欢迎向我们指正。
The hydrated silicon dioxide with three layers structure of micron-submicron-millimicron was observed through TEM.
通过电镜实验,观察到水化硅具有微米亚微米纳米三次结
。
Thewater vapor oxidation is take the high pure water steam as theoxidizing atmosphere, responds the production silicon dioxide by thesilicon chip surface silicon atom and the hydrone.
水汽化是以高纯水蒸汽为
化
,
硅片表面的硅原子和水分子反应生成
化硅。
声明:以上例句、词性分类均互联网资源自动生成,部分未经过人工审核,其表达内容亦不代表本软件的观点;若发现问题,欢迎向我们指正。
The hydrated silicon dioxide with three layers structure of micron-submicron-millimicron was observed through TEM.
电镜实验,观察到
合二氧化硅具有微米亚微米纳米三次结
。
Thewater vapor oxidation is take the high pure water steam as theoxidizing atmosphere, responds the production silicon dioxide by thesilicon chip surface silicon atom and the hydrone.
汽氧化是以高纯
蒸汽为氧化气氛,由硅片表面的硅原子
子反应生成二氧化硅。
声明:以上例句、词性类均由互联网资源自动生成,部
未经
人工审核,其表达内容亦不代表本软件的观点;若发现问题,欢迎向我们指正。
The hydrated silicon dioxide with three layers structure of micron-submicron-millimicron was observed through TEM.
通过电镜实验,观察到水合二氧化硅有
米亚
米纳米三次结
。
Thewater vapor oxidation is take the high pure water steam as theoxidizing atmosphere, responds the production silicon dioxide by thesilicon chip surface silicon atom and the hydrone.
水氧化是以高纯水
氧化气氛,由硅片表面的硅原子和水分子反应生成二氧化硅。
声明:以上例句、词性分类均由互联网资源自动生成,部分未经过人工审核,其表达内容亦不代表本软件的观点;若发现问题,欢迎向我们指正。
The hydrated silicon dioxide with three layers structure of micron-submicron-millimicron was observed through TEM.
通过电镜实验,观察到水合二具有微米亚微米纳米三次结
。
Thewater vapor oxidation is take the high pure water steam as theoxidizing atmosphere, responds the production silicon dioxide by thesilicon chip surface silicon atom and the hydrone.
水汽是以高纯水蒸汽为
气氛,由
片表面的
原子和水分子反应生成二
。
声明:以上例、词
分类均由互联网资源自动生成,部分未经过人工审核,其表达内容亦不代表本软件的观点;若发现问题,欢迎向我们指正。
The hydrated silicon dioxide with three layers structure of micron-submicron-millimicron was observed through TEM.
通过电镜实验,观察到水合硅具有微米亚微米纳米三次结
。
Thewater vapor oxidation is take the high pure water steam as theoxidizing atmosphere, responds the production silicon dioxide by thesilicon chip surface silicon atom and the hydrone.
水汽是以高纯水蒸汽为
气氛,由硅片表面的硅原子和水分子反应生成
硅。
声明:以上例句、词性分类均由互联网资源自动生成,部分未经过人工审核,其表达内容亦不代表本软件的观点;若发现问题,欢迎向我们指正。
The hydrated silicon dioxide with three layers structure of micron-submicron-millimicron was observed through TEM.
通过电镜实验,观察到合二
化硅具有微米亚微米纳米
。
Thewater vapor oxidation is take the high pure water steam as theoxidizing atmosphere, responds the production silicon dioxide by thesilicon chip surface silicon atom and the hydrone.
化是以高纯
蒸
为
化气氛,由硅片表面的硅原子和
分子反应生成二
化硅。
声明:以上例句、词性分类均由互联网资源自动生成,部分未经过人工审核,其表达内容亦不代表本软件的观点;若发现问题,欢迎向我们指正。
The hydrated silicon dioxide with three layers structure of micron-submicron-millimicron was observed through TEM.
通过电镜实验,观察到水化硅具有微米亚微米纳米三次结
。
Thewater vapor oxidation is take the high pure water steam as theoxidizing atmosphere, responds the production silicon dioxide by thesilicon chip surface silicon atom and the hydrone.
水汽化是以高纯水蒸汽为
化
,
硅片表面的硅原子和水分子反应生成
化硅。
声明:以上例句、词性分类均互联网资源自动生成,部分未经过人工审核,其表达内容亦不代表本软件的观点;若发现问题,欢迎向我们指正。