Several amorphic carbon films with different thickness were deposited on single crystal silicon by means of pulse laser ablating graphet target at room temprature.
用激光烧蚀石墨靶方法在单晶硅衬底表面沉积了不同厚度的非晶碳。
Several amorphic carbon films with different thickness were deposited on single crystal silicon by means of pulse laser ablating graphet target at room temprature.
用激光烧蚀石墨靶方法在单晶硅衬底表面沉积了不同厚度的非晶碳。
声明:以上例句、词性分类均由互联网资源自动生成,部分未经过人工审核,其表达内容亦不代表本软件的观点;若题,欢迎向我们指正。
Several amorphic carbon films with different thickness were deposited on single crystal silicon by means of pulse laser ablating graphet target at room temprature.
用激光烧蚀石墨靶方法在单晶硅衬底面沉积了
同厚度
非晶碳
。
声明:以上例句、词性分类均由互联网资源自动生成,部分未经过人工审核,其达内容亦
本软件
观点;若发现问题,欢迎向我们指正。
Several amorphic carbon films with different thickness were deposited on single crystal silicon by means of pulse laser ablating graphet target at room temprature.
用激光墨靶方法在单晶硅衬底表面沉积了不同厚度的非晶碳
。
声明:以上例句、词性分类均由互联网资源自动生成,部分人工审核,其表达内容亦不代表本软件的观点;若发现问题,欢迎向我们指正。
Several amorphic carbon films with different thickness were deposited on single crystal silicon by means of pulse laser ablating graphet target at room temprature.
用激光烧蚀石墨靶方法在单晶硅衬底表面沉积了不的非晶碳
。
声明:以上、词性分类均由互联网资源自动生成,部分未经过人工审核,其表达内容亦不代表本软件的观点;若发现问题,欢迎向我们指正。
Several amorphic carbon films with different thickness were deposited on single crystal silicon by means of pulse laser ablating graphet target at room temprature.
用激光烧蚀石墨靶方法在单晶硅衬底表面沉积了不同非晶碳
。
声明:以、词性分类均由互联网资源自动生成,部分未经过人工审核,其表达内容亦不代表本软件
观点;若发现问题,欢迎向我们指正。
Several amorphic carbon films with different thickness were deposited on single crystal silicon by means of pulse laser ablating graphet target at room temprature.
用激光烧蚀石墨靶方法在单晶硅衬底表面沉积了不同厚度非晶碳
。
声明:以上例句、词性分类均由互联网资源自动生成,部分未经过人工审核,其表亦不代表本软件
观点;若发现问题,欢迎向我们指正。
Several amorphic carbon films with different thickness were deposited on single crystal silicon by means of pulse laser ablating graphet target at room temprature.
用激光墨靶方法在单晶硅衬底表面沉积了不同厚度的非晶碳
。
声明:以上例句、词性分类均由互联网资源自动生成,部分人工审核,其表达内容亦不代表本软件的观点;若发现问题,欢迎向我们指正。
Several amorphic carbon films with different thickness were deposited on single crystal silicon by means of pulse laser ablating graphet target at room temprature.
用激光烧蚀石墨靶方法在单晶硅衬底表面沉积厚度的非晶碳
。
声明:以上例句、词类均由互联网资源自动生成,部
未经过人工审核,其表达内容亦
代表本软件的观点;若发现问题,欢迎向我们指正。
Several amorphic carbon films with different thickness were deposited on single crystal silicon by means of pulse laser ablating graphet target at room temprature.
用激光烧蚀石墨靶方法在单晶硅衬底面沉积了不同厚度的非晶碳
。
声明:以上句、词性分类均由互联网资源自动生成,部分未经过人工审核,其
容亦不代
本软件的观点;若发现问题,欢迎向我们指正。