Because the distribution of molecular director was not affected by lamellar decorating after quench, chemical etching and SEM technique were used to reveal disclination and director patterns.
The basic process of semiconductor manufacturing: including the whole process of semiconductor manufacturing, such as wafer preparation, thin film preparation, doping, etching a nd other processes.
The nanoporous structure was prepared on the surface of the platinum microelectrode by electrochemical etching, and then graphene oxide was deposited on the prepared nanoporous electrode by electrochemical deposition.
In process positions, one needs to master the entire process of semiconductor manufacturing, including wafer preparation, thin film preparation, doping, etching and other processes to ensure product quality and yield.