Several amorphic carbon films with different thickness were deposited on single crystal silicon by means of pulse laser ablating graphet target at room temprature.
用激光烧蚀石法在单晶硅衬底表面沉积了不同厚度的非晶碳
。
Several amorphic carbon films with different thickness were deposited on single crystal silicon by means of pulse laser ablating graphet target at room temprature.
用激光烧蚀石法在单晶硅衬底表面沉积了不同厚度的非晶碳
。
声明:以上例句、词性类均由互联网资源自动生
,
未经过人工审核,其表达内容亦不代表本软件的观点;若发现问题,欢迎向我们指正。
Several amorphic carbon films with different thickness were deposited on single crystal silicon by means of pulse laser ablating graphet target at room temprature.
用激光烧蚀方法在单晶硅衬底表面沉积了不同厚度的非晶碳
。
声明:以上例句、词性类均由互联网资源自动生成,
经过人工审核,其表达内容亦不代表本软件的观点;若发现问题,欢迎向我们指正。
Several amorphic carbon films with different thickness were deposited on single crystal silicon by means of pulse laser ablating graphet target at room temprature.
用激光烧蚀石墨靶方法在单晶硅衬底表面沉积了不同厚度非晶碳
。
声明:以上例句、词性分类均由互联网资源自动生成,部分未经过人工审核,其表亦不代表本软件
观点;若发现问题,欢迎向我们指正。
Several amorphic carbon films with different thickness were deposited on single crystal silicon by means of pulse laser ablating graphet target at room temprature.
用激光烧蚀石墨靶方法在单晶硅衬底表面沉积了不同厚度的非晶碳。
声明:以上例句、词性分类均由互联网资源自动生成,部分未经过人工审核,其表达内容亦不代表本软件的;
发现问题,欢迎向我们指正。
Several amorphic carbon films with different thickness were deposited on single crystal silicon by means of pulse laser ablating graphet target at room temprature.
用激光烧蚀石墨靶方法在单晶硅衬底表面沉积了不同厚度的非晶碳。
声明:以上例句、词性分类均由互联网资源自动生成,部分未经过人工审核,其表达内容亦不代表本软件的;
发现问题,欢迎向我们指正。
Several amorphic carbon films with different thickness were deposited on single crystal silicon by means of pulse laser ablating graphet target at room temprature.
用激光烧蚀石墨靶方法在衬底表面沉积了不同厚度的非
碳
。
声明:以上例句、词性分类均由互联网动生成,部分未经过人工审核,其表达内容亦不代表本软件的观点;若发现问题,欢迎向我们指正。
Several amorphic carbon films with different thickness were deposited on single crystal silicon by means of pulse laser ablating graphet target at room temprature.
用激光烧蚀石墨靶方法在单晶硅衬底表面沉积了不同厚度非晶碳
。
声明:以上例句、词性分类均由互联网资源自动生成,部分未经过人工审核,其表达内容亦不代表本软件观点;若发现问题,欢迎向我们指正。
Several amorphic carbon films with different thickness were deposited on single crystal silicon by means of pulse laser ablating graphet target at room temprature.
用激光烧蚀石墨靶方法在单晶硅衬底表面沉积了不同厚晶碳
。
声明:句、词性分类均由互联网资源自动生成,部分未经过人工审核,其表达内容亦不代表本软件
观点;若发现问题,欢迎向我们指正。
Several amorphic carbon films with different thickness were deposited on single crystal silicon by means of pulse laser ablating graphet target at room temprature.
用激光烧蚀石墨靶方法在单晶硅衬底面沉积了不同厚度
非晶碳
。
声明:以上例句、词性分类均由互联网资源自动生成,部分未经过人工审核,其达内容亦不代
软件
观点;若发现问题,欢迎向我们指正。